Dresden 2006 – scientific programme

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DS: Dünne Schichten

DS 10: Thin organic films I

DS 10.2: Talk

Tuesday, March 28, 2006, 09:45–10:00, GER 38

Systematic trends in the surface roughness of organic films — •Phenwisa Niyamakom, Maryam Beigmohamadi, Azadeh Farahzadi, Stephan Kremers, Thomas Michely, and Matthias Wuttig — I. Insitute of Physics (IA) RWTH Aachen University 52056 Aachen, Germany

Depending on the specific application, different surface morphologies are required for organic thin films. For example, in optoelectronic applications, the absence of long-range order in amorphous films can result in smooth surfaces and efficient radiative recombination, which allows for the realization of high performance organic optoelectronic devices. In order to tailor surface morphologies and hence film properties, an understanding of thin film growth is very important. For the organic film investigated in this study, the film morphology and surface roughness was measured by X-ray reflectometry (XRR) and Atomic Force Microscopy (AFM). The surface morphologies were studied for films of N,N’-diphenyl-N,N’-bis(1-naphthyl)-1-1’biphenyl-4,4"diamine (α-NPD), 4,4’-bis(2,2’ diphenylvinyl)-1,1’-biphenyl (DPVBI) and 2,2’,7,7’-tetrakis(2,2-diphenylvinyl)spiro-9,9’-bifluorene (Spiro-DPVBI). A clear difference in roughness of the different materials is observed and explained by a model. The influence of the deposition rate has been investigated in addition for films of N,N’-diphenyl-N,N’-bis(1-naphthyl)-1-1’ biphenyl-4,4"diamine (α-NPD) and tris-(8-hydroxyquinoline)aluminum (Alq3).

Financial support by the BMBF is gratefully acknowledged.