Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 14: Growth of thin films
DS 14.2: Vortrag
Mittwoch, 29. März 2006, 14:15–14:30, GER 38
Effect of substrate temperature and thickness on nano-structure of UHV deposited Titanium thin films — •Mehran Gholipour1, Hadi Savaloni1, and Michael Antony Player2 — 1Department of Physics, University of Tehran, North-Kargar Avenue, Tehran ,Iran — 2Department of Engineering, University of Aberdeen, Aberdeen AB24 3UE, U.K
The effect of substrate temperature and film thickness on micro-structure of Titanium thin films is investigated. Titanium thin films were deposited on glass substrate at different substrate temperatures in the range of 313 to 600 K with different thickness in the rang of 20-240 by electron beam evaporation using a Balzers UMS 500U UHV. Deposition rate was 0.29 Ås-1 and monitored by a quadruple mass spectrometer and controlled by feedback to the evaporation source. Crystallite sizes (size of coherently diffracting domains) and micro-strain are evaluated using Scherrer and Stocks-Wilson relations, Double-Voigt (DV) and Warren-Averbach (WA) methods. Results show that Ti samples are oriented in (002) direction at low thickness and substrate temperature and preferred orientation changed to (101) at highest thickness and substrate temperature. Crystallites size of Ti samples increased with temperature, thickness but micro-strain and lattice constants decrease with thickness. Crystallite sizes distribution function was obtained from the size broadened part of DV function, and results show a shift in the maximum to larger sizes with increasing the temperature and thickness. Keywords: size-strain analysis; XRD; Warren-Averbach; Double-Voigt