Dresden 2006 – scientific programme

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DS: Dünne Schichten

DS 14: Growth of thin films

DS 14.3: Talk

Wednesday, March 29, 2006, 14:30–14:45, GER 38

Deposition rate and thickness dependence of nano-structure of UHV deposited silver thin films — •Mehran Gholipour Shahraki^1,2, Hadi Savaloni^1,2, and Michael Antony Player³ — ¹Plasma Physics Research Center, Science and Research Campus of I. A. University, P. O. Box 14665-678, Tehran, Iran — ²Department of Physics, University of Tehran, North-Kargar Avenue, Tehran ,Iran. — ³Department of Engineering, University of Aberdeen, Aberdeen AB24 3UE, U.K.

Silver thin films of different thickness were deposited on float glass substrate at different deposition rates ranging from 0.4 to 22.5 Ås⁻¹ by electron beam evaporation using a Balzers UMS 500U UHV at substrate temperature of 313 K. Preferred orientation, crystallite sizes (size of coherently diffracting domains) and micro-strain, stacking and twin faults probability are evaluated using Scherrer-Williamson-Hall plot, Single Voigt and Double-Voigt methods. XRD analysis of Ag samples showed that Ag samples are oriented in (111) direction normal to the substrate surface. Results show that the Crystallite sizes increase with deposition rate while micro-strain and lattice constants decrease with thickness. Crystallite sizes distribution function was obtained from the size broadened part of DV function, and results show a shift in the maximum to larger sizes with increasing the thickness and deposition rates. Keywords: size-strain analysis; Silver thin films; XRD