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DS: Dünne Schichten
DS 17: Ion beam solid interaction II
DS 17.1: Vortrag
Donnerstag, 30. März 2006, 11:15–11:30, GER 37
Nanobeam — •Thomas Vogel1, J. Meijer1, B. Burchard1, I. Rangelow2, L. Bischoff3, J. Wrachtrup4, F. Schmidt-Kaler5, and H. Wiggers6 — 1Ruhr-Universität Bochum, RUBION — 2Uni Kassel, Technische Physik — 3Forschungszentrum Rossendorf, Ionenstrahl Physik — 4Universität Stuttgart, 3. phys. Institut — 5Universität Ulm, Quanten-Informationsverarbeitung — 6Uni Duisburg-Essen, Institut für Verbrennung und Gasdynamik
A new setup for the formation of a particle beam with nanometer resolution will be presented. The main idea is to use an Atomic-Force-Microscope with a modified tip which acts as an aperture for the particle beam. Therefore a small hole with a diameter of some ten nanometer has to be drilled into the AFM-tip by focussed ion beam. The AFM can be used for orientation on the sample surface. Simultaneously particles can then be deposited on defined sites. The next step is to manufacture an electrostatic micro-lens placed on the AFM-tip to actively focus the particle beam. With this setup a spatial resolution for the particle deposition of some nanometer is achievable. Different sources can be used for the formation of the particle beam: A cluster-source that produces particles with a size of some nm, an ion gun to produce a beam of single ions or an ion trap, to reach the highest spatial resolution of below 1 nm. The presented technique can for example be used to create luminescence centres in diamond by single ion implantation. Such single photon sources can be quantum mechanically coupled if placed in near vicinity and be used for quantum computational operations.