DS 17: Ion beam solid interaction II
Thursday, March 30, 2006, 11:15–12:45, GER 37
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11:15 |
DS 17.1 |
Nanobeam — •Thomas Vogel, J. Meijer, B. Burchard, I. Rangelow, L. Bischoff, J. Wrachtrup, F. Schmidt-Kaler, and H. Wiggers
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11:30 |
DS 17.2 |
Relaxation of slow highly charged ions penetrating a solid surface - energy deposition and reemission — •Daniel Kost and Stefan Facsko
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11:45 |
DS 17.3 |
SHI Induced Phase Formation At NiO/Si-Interfaces — •Wolfgang Bolse, Christian Dais, Thunu Bolse, Siegfried Klaumünzer, Peter Schubert-Bischoff, and Jörg K.N. Lindner
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12:00 |
DS 17.4 |
Ion beam enhanced etching of LiNbO3 — •Thomas Gischkat, Frank Schrempel, Holger Hartung, Ernst-Bernhard Kley, and Werner Wesch
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12:15 |
DS 17.5 |
Dewetting of thin metal-oxide films on silicon under swift heavy ion bombardment — •Thunu Bolse, Klara Lyutovich, Hartmut Paulus, Bouchaib Bouhachi, Siegfried Klaumünzer, and Wolfgang Bolse
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12:30 |
DS 17.6 |
Ion-beam induced nano-sized metal clusters in glass — •Heinz-Eberhard Mahnke, Beate Schattat, Ivo Zizak, Peter Schubert-Bischoff, Nikola Novakovic, and Vasil Koteski
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