DS 19: Thin film deposition and process characterization I
Donnerstag, 30. März 2006, 11:30–12:45, GER 38
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11:30 |
DS 19.1 |
In-situ mechanical spectroscopy on pulsed laser deposited polymer films — •Thorsten Scharf, Erik Süske, and Hans-Ulrich Krebs
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11:45 |
DS 19.2 |
Ba substituted Pb(ZrxTi1−x)O3 Thin Films grown by MOCVD — •Jochen Puchalla, Susanne Hoffmann-Eifert, and Rainer Waser
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12:00 |
DS 19.3 |
In situ doping profiling of MOVPE-grown GaAs — •Ch. Kaspari, M. Pristovsek, and W. Richter
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12:15 |
DS 19.4 |
Role of positive ions in reactive sputtering of Al-doped ZnO thin films — •F. Ruske, V. Sittinger, W. Werner, B. Szyszka, R. Wiese, M. Hannemann, and H. Kersten
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12:30 |
DS 19.5 |
Thin film combined systems for detection of ionizing radiation — •Sergiy Nedilko, Volodymyr Degoda, Borys Okhrimenko, Igor Zakharchenko, Yuriy Zorenko, and Georgiy Malashkevich
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