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DS: Dünne Schichten
DS 2: Optical properties of thin films II
DS 2.3: Vortrag
Montag, 27. März 2006, 12:15–12:30, GER 37
Film Thickness Dependence on The Optical Properties of Ni Thin Films — •Farnaze Maghazeh1, Hadi Savaloni1,2, and Michael A Player3 — 1Plasma Physics Research Center, Science and Research Campus of I. A. University, P. O. Box 14665-678, Tehran, Iran — 2Department of Physics, University of Tehran, North-Kargar Street, Tehran, Iran — 3Department of Engineering, University of Aberdeen, Aberdeen AB24 3UE, U.
Abstract
Ni films of 30 to 130 nm thickness deposited on glass substrates, at 590 K substrate temperature. The optical reflectivity of samples were measured, using spectrophotometery method in the spectral range of 200 to 3000 nm. The optical functions of the films were obtained by Kramers Kronig method. The Effective Medium Approximation (EMA) analysis was used to establish the relationship between the structural changes through film thickness and EMA predictions. The predictions of the Drude free-electron theory are compared with experimental results for dielectric functions of Ni films of different thickness. The variation of both real part and imaginary part of the dielectric constant with film thickness is discussed. Keywords: Effective Medium Approximation (EMA); Optical functions; Substrate temperature; Kramers Kronig; Drude Model.