Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 2: Optical properties of thin films II
DS 2.4: Vortrag
Montag, 27. März 2006, 12:30–12:45, GER 37
Substrate Temperature Dependence on The Optical Properties of Ti Thin Films — •Haleh Kangarloo1, Hadi Savaloni1,2, Fahimeh Farid-Shayegan1, and Michael Player3 — 1Plasma Physics Research Center, Science and Research Campus of I. A. University, P. O. Box 14665-678, Tehran, Iran — 2Department of Physics, University of Tehran, North-Kargar Street, Tehran, Iran — 3Department of Engineering, University of Aberdeen, Aberdeen AB24 3UE, U.K
Abstract
Ti films of 68 nm thickness deposited on glass substrates, at different substrate temperatures (Ts). Their optical properties were measured by spectrophotometery in the spectral range of 200 to 3000 nm. Kramers Kronig method was used for the analysis of the reflectivity curves of samples to obtain the optical constants. The influence of Ts on the microstructure of thin metallic films [Structure Zone Model (SZM)] is well established (Movchan and Demchishin (1969); Thornton (1975);Savaloni et al(1995, 2002)). The Effective Medium Approximation (EMA) analysis was used to establish the relationship between the SZM and EMA predictions. The predictions of the Drude free-electron theory are compared with experimental results for dielectric functions of Ti films of different Ts. The real part of the dielectric constant is increased with substrate temperature, while the imaginary part of the dielectric constant, in general, decreased with increasing the temperature over the whole energy range measured, including interaband and interband regions.