Dresden 2006 – scientific programme
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DS: Dünne Schichten
DS 20: Ion beam induced nanostructures
DS 20.2: Talk
Thursday, March 30, 2006, 14:45–15:00, GER 37
Self-organized pattern formation on Si and Ge surfaces during low-energy ion beam erosion — •Frank Frost, Bashkim Ziberi, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstrasse 15, D-04318 Leipzig
Self-organization during low-energy ion bombardment or erosion of solid surfaces is a promising approach for the generation of large-area nanostructured surfaces. In addition to superficial materials removal upon sputtering, caused by energy and momentum transfer from the incoming ions to target atoms, the interplay between sputter-induced roughening and various surface relaxation mechanisms can lead to a wide range of surface topographies and patterns. In this contribution recent findings on topography evolution on Si and Ge surfaces caused by low energy noble gas ion beam erosion (Ar+, Kr+, Xe+; Eion ≤ 2000 eV)at normal and oblique ion incidence at room temperature are summarized. In particular, it is demonstrated that various surface topographies do arise during erosion of surfaces depending on ion species, ion energy and ion incidence angle. Examples for highly ordered dot as well as ripple pattern are shown where the size of the individual structure elements (ripples or dots) is well below 50 nm.