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DS: Dünne Schichten

DS 20: Ion beam induced nanostructures

DS 20.6: Vortrag

Donnerstag, 30. März 2006, 15:45–16:00, GER 37

Ion sputtering induced surface nanostructuring of ferromagnetic thin films — •Kun Zhang¹, Frank Rotter¹, Carsten Ronning¹, Hans Hofsäss¹, Michael Uhrmacher¹, and Johann Krauser² — ¹II. Physikalisches Institut and SFB 602, Universität Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — ²Fachbereich Automatisierung und Informatik, Hochschule Harz, Friedrichstraße 57-59, 38855 Wernigerode, Germany

We have investigated the possibility of nanoscale ripple formation on polycrystalline iron and nickel thin films (typically of 100 nm in thickness) and the correlation between surface morphology and magnetic textures of these films. Sputter erosions were performed by using Xe ions at room temperatures with energies between 4 keV and 10 keV, ion fluences up to 1×10¹⁷ ions/cm², and incidence angle up to 85^∘ respective to the surface normal. Atomic force microscopy, magneto optical Kerr effect, and Rutherford backscattering have been used to characterize the evolution of surface morphology, magnetic properties and sputter yield, respectively. The as-deposited films have a rms roughness of 1 nm and magnetically isotropic properties. The sputter erosion increased the surface roughness and decreased the coercive field of the films. Ripple formation was observed at incidence angles of θ ≥ 80^∘ for an ion-energy of 5 keV and an ion-fluence of 1×10¹⁶ ions/cm². A small uniaxial magnetic anisotropy was detected being parallel to the ripple orientation and the direction of the incident ion beam.