DS 20: Ion beam induced nanostructures
Donnerstag, 30. März 2006, 14:00–16:15, GER 37
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14:00 |
DS 20.1 |
Hauptvortrag:
Nanostructures by grazing incidence ions: ripple patterns, athermal coarsening and subsurface channeling — •Thomas Michely
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14:45 |
DS 20.2 |
Self-organized pattern formation on Si and Ge surfaces during low-energy ion beam erosion — •Frank Frost, Bashkim Ziberi, and Bernd Rauschenbach
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15:00 |
DS 20.3 |
Formation of nanopatterns induced by low-energy ion sputtering of Si surfaces — •Frank Rotter, Kun Zhang, Carsten Ronning, Hans Hofsäss, Michael Uhrmacher, and Johann Krauser
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15:15 |
DS 20.4 |
In-situ X-Ray Diffraction of GaSb Nanopatterned by Normal Incidence Sputter Erosion — •Adrian Keller, Stefan Facsko, Olivier Plantevin, Dina Carbone, Hartmut Metzger, and Raul Gago
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15:30 |
DS 20.5 |
Ripple to dot transition on Si and Ge surfaces by ion beam erosion — •Bashkim Ziberi, Frank Frost, Dina Carbone, Hartmut Metzger, and Bernd Rauschenbach
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15:45 |
DS 20.6 |
Ion sputtering induced surface nanostructuring of ferromagnetic thin films — •Kun Zhang, Frank Rotter, Carsten Ronning, Hans Hofsäss, Michael Uhrmacher, and Johann Krauser
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16:00 |
DS 20.7 |
Self-organized nanoscale multilayer growth during the deposition of hyperthermal species — •Hayo Zutz, Inga Hannstein, Carsten Ronning, Michael Seibt, Hans Hofsäss, Wan-Yu Wu, and Jyh-Ming Ting
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