Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Poster presentation
DS 24.11: Poster
Dienstag, 28. März 2006, 15:00–17:30, P2
Structural and optical characterization of CuAlO2 thin films prepared by RF reactive sputtering — •Yinmei Lu, Bin Yang, Angelika Polity, Christian Neumann, Dietmar Hasselkamp, Niklas Volbers, and Bruno K. Meyer — I. Physikalisches Institut, Justus-Liebig-Universität Giessen, Heinrich-Buff-Ring 16, D-35392 Giessen, Germany
Transparent CuAlO2 thin films have been deposited on various kinds of substrates such as float glass, quartz and single-crystal sapphire by RF reactive sputtering using a stoichiometric CuAlO2 ceramic target. The ceramic target with a diameter of 7.8 cm and 7 mm in thickness was self-made via a traditional ceramic fabrication process. X-ray diffraction (XRD) identified a single delafossite CuAlO2 phase of the ceramic target. The thin films were typically deposited with a fixed sputter power of 300 W at room temperature, and then annealed in air at temperatures between 900 and 1100 ∘C. X-ray diffraction revealed that the as-sputtered films are amorphous, which crystallize during annealing evolving a mixture phase of CuAlO2, CuAl2O4, and elemental Al. The surface morphology of the films was characterized by scanning electron microscopy (SEM). The composition and homogeneity of the films were examined using Rutherford backscattering spectroscopy (RBS) and secondary ion mass spectroscopy (SIMS), respectively. Typically the films are slightly Al-rich and have good depth homogeneity. The absorption coefficients and optical bandgaps of the films were estimated by optical transmission measurements at room temperature, which revealed a bandgap of 3.3-3.8 eV of the sputtered and annealed CuAlO2 films.