Dresden 2006 – wissenschaftliches Programm
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DS: Dünne Schichten
DS 24: Poster presentation
DS 24.19: Poster
Dienstag, 28. März 2006, 15:00–17:30, P2
Characterisation of thin PTFE-like fluorocarbon films produced using plasma deposition processes — •Vasil Yanev1,2, Marcel Himmerlich1,2, Stefan Krischok1,2, Gabriel Kittler2, Oliver Ambacher2, and Juergen A. Schaefer1,2 — 1Institut für Physik, TU Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany — 2Zentrum für Mikro- und Nanotechnologien, TU Ilmenau, P.O. Box 100565, 98684 Ilmenau, Germany
Fluorocarbon (FC) thin films are attractive for optical, tribological, microelectronics and Micro-Electro-Mechanical Systems (MEMS) applications because of their unique surface and physical properties. Thin PolyTetraFluoroEthylene-like (PTFE-like) films were deposited on Si(111) using plasma polymerisation at various process conditions. To characterise the properties of these films different techniques such as X-ray Photoelectron Spectroscopy (XPS), ellipsometry, electrical and contact angle measurements were applied. XPS spectra (C1s peaks) indicate the presence of CF3, CF2, CF, and C–C bonds typical for crosslinked and/or branched PTFE-like plasma polymer structures. All FC coatings show a very low surface free energy (sessile contact angle with water varying between 103∘ and 115∘), very low refractive indexes varying between 1.35 and 1.44 and excellent dielectric properties (measured dielectric constant, thin film breakdown voltage, field strength and leakage current).