Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

DS: Dünne Schichten

DS 24: Poster presentation

DS 24.22: Poster

Dienstag, 28. März 2006, 15:00–17:30, P2

Electrical and optical properties of electrodeposited Cr ultra-thin films on Si (100) substrate — •Violeta Georgescu and Cristina Sirbu — Faculty of Physics, Al. I. Cuza University, Iasi, Romania

Electronic transport properties of ultra-thin films and of nanometer-sized crystallites of metals deposited onto semiconductors play an important role for the development of nanoscaled electronic devices. In this work, we report the electrical and optical properties of ultra-thin films (2 nm * 50 nm) composed of Cr nano-crystal electrodeposited onto silicon single crystal. The films were prepared by electrodeposition from a solution based on CrO₃ under potentiostatic conditions. Atomic force microscopy has been employed to investigate the morphology of ultra-thin films and the distribution of the Cr nano-crystals grown by this method on n-type Si (100) substrate P-doped. Reflection spectra for ultra-thin Cr/Si films with various thicknesses were recorded in the photon energy range 1.18*3.1eV using a computer controlled STEAG-ETA Optic Spectrometer. Electronic transport behavior performed at room temperature in the plane of the films revealed the type of electrical conduction. Analysis of photo-resistance for various samples allows us to detect the onset of metallic conductivity due to percolation of island-like Cr metal films onto semiconductor substrate. In the case of very small Cr nano-crystals one can observe specific quantum size effects