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DS: Dünne Schichten

DS 24: Poster presentation

DS 24.2: Poster

Dienstag, 28. März 2006, 15:00–17:30, P2

Self-Organized Surface Patterning — •Michael Hirtz^1,2, Xiaodong Chen^1,2, Harald Fuchs^1,2, and Lifeng Chi^1,2 — ¹Physikalisches Institut WWU Münster, Wilhelm-Klemm-Straße 10, 48149 Münster — ²CeNTech, Gievenbecker Weg 11, 48149 Münster

Surface patterning is of great importance in modern science and technology. Patterning is usually achieved by top-down strategies, such as optical and e-beam lithography, soft-lithography, scanning probe lithography, and nanoimprint lithography. In contrast, the concepts of self-assembly and self-organization provide another interesting route toward the formation of patterned structures via a bottom-up approach. Here, we present the formation of regular striped patterns in a self-organized manner by means of Langmuir-Blodgett (LB) technique, and their applications.