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Dresden 2006 – scientific programme

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DS: Dünne Schichten

DS 24: Poster presentation

DS 24.66: Poster

Tuesday, March 28, 2006, 15:00–17:30, P2

Burying Au-Nanoparticles into Si-Substrates by Ion-Irradiation — •Andreas Klimmer1, Johannes Biskupek2, Hans-Gerd Boyen1, Ute Kaiser2, and Paul Ziemann11Abt. Festkörperphysik, Universität Ulm — 2ZE Elektronenmikroskopie, Universität Ulm

Arrays of Au nanoparticles, arranged hexagonally on top of Si substrates, were irradiated with 200 keV Ar+ and Xe+ ions of various fluences up to 1016 ions/cm2. Characterisation of the bombarded samples was carried out using SEM, AFM and TEM measurements.

Above certain fluences (depending on the ion species) cross-sectional TEM measurements demonstrate that complete Au nanoparticles are buried within the Si substrate with their spherical shape conserved. A possible explanation of this effect refers to a viscious flow of the underlying substrate as a consequence of the ion irradiation [1]. In this model, the Au particles are driven into the Si substrate by capillary forces resulting from the difference between the Au surface energy and the interface energy of SiO2-Au or Si-Au, respectively. As a consequence, the particles should not sink further, once they are completely covered by substrate material.

The above described ion induced particle sinking is studied in detail using Au nanoparticles with diameters ranging from 2 nm to 10 nm, applying ion irradiation at room temperature as well as at low temperatures (30 K).

[1] Y. Zhong et al., J. Appl. Phys. 94 4432 (2003)

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