Dresden 2006 – scientific programme
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DS: Dünne Schichten
DS 24: Poster presentation
DS 24.9: Poster
Tuesday, March 28, 2006, 15:00–17:30, P2
Reactive Deposition of TiOx-Layers in a DC-Magnetron Discharge — •Stefan Wrehde1, Marion Quaas2, Hartmut Steffen1, Oleg Zhigalov1, Harm Wulff2, and Rainer Hippler1 — 1Institute of Physics, Ernst-Moritz-Arndt-University Greifswald, Domstraße 10a, D-17489 Greifswald, Germany — 2Institute of Chemistry and Biochemistry, Ernst-Moritz-Arndt-University Greifswald, Soldmannstraße 16, D-17489 Greifswald, Germany
The properties of thin solid films produced by plasma activated deposition are strongly influenced by the ions hitting the substrate. To get information about type, energy and density of these incoming ions a DC magnetron plasma for reactive deposition of TiOx-layers was characterized under different discharge conditions by means of energy resolved mass spectrometry. Absolute values of the ion current densities of the different species could be obtained by using the ion saturation current. It was found that discharge power, chamber pressure, reactive gas flow and operation mode of the magnetron influence the shapes of the IVDF as well as the ion current densities.
In the second step TiOx-layers were deposited under the examined conditions and investigated using different X-ray-methods as X-ray photoelectron spectroscopy and X-ray reflectometry and diffractometry at grazing incidence. These measurements showed that the deposition rates are higher and the incorporation of oxygen into the layers is lower in unbalanced mode.