Dresden 2006 – scientific programme

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DS: Dünne Schichten

DS 3: Thin film analysis I

DS 3.4: Talk

Monday, March 27, 2006, 10:45–11:00, GER 38

Residual stress analysis in multilayer systems with synchrotron radiation - complementary investigations using angle and energy dispersive diffraction methods — •Manuela Klaus, Ingwer Denks, and Christoph Genzel — Hahn-Meitner-Institut (c/o BESSY), Albert-Einstein-Straße 15, D-12489 Berlin

Residual stress analysis in multilayer systems consisting of stacks of alternating sublayers poses a special challenge for the measuring as well as the evaluation procedures to be applied. So neighbouring sublayers in the stack may be of similar composition leading to strongly overlapping diffraction lines, or sublayers of identical structure contributing to the same diffraction line are separated by small sublayers of other structure. In both cases problems arise, when the measured diffraction signal should be assigned to some information depth within the multilayer. To overcome these difficulties, different approaches are possible. In any case, they require the use of highly parallel synchrotron radiation being available within a broad energy range that extends from about 5 keV to about 150 keV. It will be shown that both, angle and energy dispersive diffraction yield results which complement one another. So wavelength tuning at absorption edges, for example, allows for the separated analysis of adjoining near surface sublayers being similarly composed, whereas high resolution white beam strain scanning yields depth resolved information even on burried sublayers close to the interface as well on the residual stress distribution in the substrate itself.