Dresden 2006 – scientific programme

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DS: Dünne Schichten

DS 7: Mechanical properties of thin films

DS 7.3: Talk

Monday, March 27, 2006, 16:30–16:45, GER 38

Evaluation of Adhesion of Diamond/Tungsten carbide Composite Films Prepared by Microwave Plasma Assisted CVD. — •Hisham Abu Samra, Ruijiang Hong, Thorsten Staedler, and Xin Jiang — Institute of Materials Engineering, University of Siegen, Siegen, Germany

Diamond coatings are in demand in a wide range of applications. Unfortunately, the adhesion issues of this film system in the context of many technical substrates are still to be solved. One proposed solution is to increase the adhesion strength by depositing a functional gradient diamond/carbide composite film. In this study, we investigate the adhesion strength of the following coating systems: (i) diamond (ii) diamond/tungsten carbide and (iii) diamond with diamond/tungsten carbide composite as an interlayer on tungsten and WC-Co substrates. The films were prepared in a single microwave plasma assisted chemical vapour deposition (MWCVD) process. The adhesion strength was assessed by employing indentation tests using a Brinell indenter with loads up to 1225 N. In addition, Finite-Element-Method (FEM) simulations were carried out to calculate the stress state and the stress distribution of these systems. The simulation results are correlated with the experimental findings.