HL 44: Si/Ge
Donnerstag, 30. März 2006, 12:15–13:15, BEY 118
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12:15 |
HL 44.1 |
Polycrystalline Silicon Films Obtained from Spin-coated Dispersed Nanocrystalline Silicon Layers — •R. Lechner, Nuryanti, C. Oberhüttinger , M. S. Brandt, A. Ebbers, F.-M. Petrat, and M. Stutzmann
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12:30 |
HL 44.2 |
Phase segregation in laser-crystallized polycrystalline SiGe thin films — •Moshe Weizman, Norbert Nickel, Ina Sieber, and Baojie Yan
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12:45 |
HL 44.3 |
Ultra-thin polycrystalline silicon layers on glass substrates — •Michael Scholz, Tobias Antesberger, Sebastian Gatz, Mario Gjukic, and Martin Stutzmann
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13:00 |
HL 44.4 |
MOCVD of Epitaxial Germanium Nanowires on Silicon — •Tim Echtermeyer, Stephan Senz, Volker Schmidt, and Ulrich Goesele
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