Dresden 2006 – scientific programme

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HL: Halbleiterphysik

HL 50: Poster II

HL 50.39: Poster

Thursday, March 30, 2006, 16:30–19:00, P3

A process for screening of organic semiconductor properties based on sub micron thin film transistors — •Christian Rickert, Michael Leufgen, Georg Schmidt, and Laurens Molenkamp — Physikalisches Institut (EPIII), Universität am Hubland, 97074 Würzburg, Germany

We present a highly reproducible and fast process for the screening of electrical properties of organic thin film transistors based on various semiconducting polymers. In order to achieve a channel length of 500 nm while maintaining high throughput we have chosen a process based on all optical lithography using a thin photoresist. The transistors were fabricated in a common gate technology on silicon wafers with a 50 nm thick thermal oxide. We will present the process and results for several polymer based semiconductors. Field effect mobilities obtained in different regimes will be shown along with the influence of different contact materials. Also results on wafers with thinner oxides were carried out in order to reduce short channel effects which can occur when downscaling the transistors.