Dresden 2006 – wissenschaftliches Programm

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MA: Magnetismus

MA 20: Poster: Films(1-36) Transp(37-56) Ex.Bias(57-67) Spindyn(68-80) Micromag(81-95) Particle(96-109) Imag.+Surface(110-113) Spinelectr(114-122) Theory+Micromag(123-131) Spinstr+Aniso(132-142) MagMat(143-156) Meas(157,158) MolMag+Kondo(159-162) Postdead(163-)

MA 20.157: Poster

Dienstag, 28. März 2006, 15:15–19:15, P1

Magnetostrictive GMR sensors on flexible polyimid substrates — •Thomas Uhrmann^1,2, Ludwig Bär¹, Theodoros Dimopoulos^1,3, Nils Wiese^1,4, Manfred Rührig¹, and Alfred Lechner² — ¹Siemens AG Corporate Technology, Dept. CT MM 1, Erlangen, Germany — ²University of Applied Sciences Regensburg, Regensburg, Germany — ³ARC Seibersdorf research GmbH, Vienna, Austria — ⁴Universität Bielefeld, Nano Device Group, Bielefeld, Germany

The feasibility of a stress sensor based on giant magnetoresistance (GMR) on a flexible polyimide substrate is presented. Therefore a stack system with a GMR effect of up to 8.4% has been deposited on a polyimide substrate and patterned to micrometer scaled sensor elements. An in plane tensile stress was applied to the sensor to achieve a rotation of the anisotropy of the magnetostrictive free-layer. The magneto-optical and magnetoresistive effect was measured. The stress dependence of the Co₅₀Fe₅₀ free layer magnetization was measured up to a elongation of 2.5% in a (CoFe/Cu/CoFe) GMR system. The magneto-optical results are compared to the resistance loops of the sample. Furthermore the normalized sensor output is shown as a function of the applied stress at several bias fields and the remanent state.