Dresden 2006 – scientific programme

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MA: Magnetismus

MA 20: Poster: Films(1-36) Transp(37-56) Ex.Bias(57-67) Spindyn(68-80) Micromag(81-95) Particle(96-109) Imag.+Surface(110-113) Spinelectr(114-122) Theory+Micromag(123-131) Spinstr+Aniso(132-142) MagMat(143-156) Meas(157,158) MolMag+Kondo(159-162) Postdead(163-)

MA 20.41: Poster

Tuesday, March 28, 2006, 15:15–19:15, P1

Influence of stress on film growth mode and GMR in Cu/Co multilayers — •Senthilnathan Mohanan, Andreas Grob, and Ulrich Herr — Materials Division, Albert-Einstein-Allee 47, Universität Ulm, 89081 Ulm, Germany

Co/Cu multilayers exhibiting the giant magnetoresistance (GMR) effect are used as sensors in various fields of application. The transport properties of the multilayer can be modified by changing the number of Co/Cu bilayers. The stress which is induced in the multilayers during deposition may influence the film growth mode and hence the magnetotransport properties. The main aim of this study is to investigate the influence of stress on the film growth mode of Co/Cu multilayer with Ta buffer layer and on its magnetotransport properties. An increase in the giant magnetoresistance has been observed with increasing number of Co/Cu bilayers. However, beyond a certain number of bilayers we observed a drop in GMR. This change is well accompanied by a corresponding change in magnetic characteristics. In order to investigate the origin of the changes in the magnetotransport properties, the surface roughness of the samples was studied using atomic force microscopy, which revealed the existence of a sharp increase in the roughness beyond a certain number of bilayers. Stress measurements showed that there exists a sharp increase in stress beyond the same number of bilayers. The increase in roughness indicates a change in the film growth mode due to the change in the intrinsic stress of the multilayers. This change in the film growth mode leads to the observed modification of the magnetic and magnetotransport properties.