Dresden 2006 – scientific programme
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MA: Magnetismus
MA 7: Micro- and Nanostructured Magnetic Materials I
MA 7.12: Talk
Monday, March 27, 2006, 17:45–18:00, HSZ 03
Magnetic nanostructures produced by micelle masks — •S. Pütter1, H. Stillrich1, A. Frömsdorf2, C. Menk1, R. Frömter1, S. Förster2, and H. P. Oepen1 — 1Institut für Angewandte Physik, Jungiusstr. 11, 20355 Hamburg — 2Institut für Physikalische Chemie, Grindelallee 117, 20146 Hamburg
The production of magnetic nanostructure arrays on the length scale of centimeters is a challenge of today’s research. Usually, lithography is used though it is very time consuming. We follow an alternative way by utilizing self organized micelle patterns as masks. The micelles consist of diblock copolymers and can be produced in the diameter range from 20 nm to 100 nm. By dip coating single layers of micelles are deposited onto the substrates. The micelles form an almost hexagonal array with height modulation smaller than the micelle diameter.
Various ways to produce nanostructures are possible and applied. The growth of magnetic films on top of the micelles preserves the morphology. By sputtering the sample at grazing incidence the caps of the micelles are taken off and an antidot array is produced. An alternative way is to use filled micelles (e.g. with SiO2). These micelles are deposited onto magnetic films. Sputtering at normal incidence produces a dot array due to different sputtering yields.
We have investigated the morphology and topography of the nanostructure arrays by SEM and AFM. We correlate the results of the afore mentioned studies with the magnetic behaviour obtained via magneto optical Kerr effect as well as scanning electron microscopy with polarization analysis.