Dresden 2006 – scientific programme

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MM: Metall- und Materialphysik

MM 29: Poster Session (SYNW)

MM 29.2: Poster

Thursday, March 30, 2006, 10:00–11:00, P4

Integration of nanowires into microstructures by thin film fracture — •Seid Jebril, Mady Elbahri, and Rainer Adelung — Christian Albrechts Universitaet kiel

Microstructured PMMA- silicon substrate show a foot step in the formation of well aligned cracks. These microstructures were done by conventional lithography. The cracks are formed as a result of thermal stress. The shape of the microstructure affects the strain and stress concentration and creates predetermined fracture points which later relax via cracks. The cracks that are formed in such a manner serve as a template for the formation of nanowires, which are fabricated by metal deposition and consecutive mask lift-off. We report that channels made by conventional lithography can have a great influence on the control of the alignments of nanowires. These alignments can be precisely controlled by tailoring the width of the channels. When the channel in the order of around 10 microns, a regular zigzag nanowire pattern was observed. For example 20 Platinum nanowires with a zigzag fashion and aligned by 45 degree were fabricated in channels of 10 micrometer width and a length of 200 micrometer. These nanowires were connected end to end across the length of the channel with contacts. By tailoring the channel width, it is possible to control the alignment of the wire pattern in a desired way.