Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 14: Poster session I (Adsorption, Epitaxy and growth, Phase transitions, Surface reactions, Organic films, Electronic structure, Methods) (sponsored by Omicron Nanotechnology GmbH)
O 14.65: Poster
Montag, 27. März 2006, 18:00–21:00, P2
ARUPS and XPS studies of phenylazobenzoic acid on the layered material HfS2 — •Meike Quitzau, Claas Thede, Bridget Murphy, Jaroslaw Iwicki, Kai Rossnagel, and Lutz Kipp — Institut für Experimentelle und Angewandte Physik, Universität Kiel, D-24098 Kiel
The photoisomerisation process is very interesting in particular for molecular switches and image storing devices. Phenylazobenzoic acid C13H10N2O2, a derivative of azobenzene, changes under irradiation of light of 365 nm from the trans to the cis conformation. This photoisomerisation process is reversible at a wavelength of 438 nm. In this study phenylazobenzoic acid was evaporated onto a HfS2 substrate under UHV conditions and electronic structure changes were measured by X-ray and angle resolved photoemission spectroscopy using synchrotron radiation delivered by the BW3 and HONORMI beamlines at HASYLAB. The XPS measurements confirm the adsorption of phenylazobenzoic acid on HfS2. Furthermore, the observed core level shifts give information about a possible photoisomerisation of the phenylazobenzoic acid on HfS2. Changes in valence band maximum and band structure after evaporation with phenylazobenzoic acid were observed.
This work is supported by the DFG Forschergruppe FOR 353.