Dresden 2006 – scientific programme

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O: Oberflächenphysik

O 29: Poster session II (Nanostructures, Magnetism, Particles and clusters, Scanning probe techniques, Time-resolved spectroscopy, Structure and dynamics, Semiconductor surfaces and interfaces, Oxides and insulators, Solid-liquid interfaces)

O 29.2: Poster

Wednesday, March 29, 2006, 14:30–17:30, P2

Ultraflat Ternary Nanopatterns Fabricated via Colloidal Lithography — •Michael Himmelhaus, Oliver Worsfold, Conor Whitehouse, and Jonathan Wright — Bionanotechnology Research Project, R&D Devision, Fujirebio, Inc., 51 Komiya-cho, Hachioji-shi, Tokyo 192-0031, Japan

Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template-stripping processes to produce ultraflat ternary nanopatterns of large lateral extension. As confirmed by atomic/friction force microscopy (AFM/FFM) the patterns provide a new type of model surface particularly useful for applications that demand proper distinction between surface chemistry and topography. By right choice of materials for fabrication of the inorganic pattern, the resulting features can be selectively functionalized with self-assembled monolayers, thereby altering surface properties of the addressed regions only. We found that the size of the circular patches, which can be fabricated by our method, is reduced to 60% of the nominal diameter of the colloidal particles used to produce the colloidal mask. Accordingly, the minimum size of circular features that can be fabricated by colloidal lithography is significantly reduced.