Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 29: Poster session II (Nanostructures, Magnetism, Particles and clusters, Scanning probe techniques, Time-resolved spectroscopy, Structure and dynamics, Semiconductor surfaces and interfaces, Oxides and insulators, Solid-liquid interfaces)
O 29.30: Poster
Mittwoch, 29. März 2006, 14:30–17:30, P2
Oxidation of electrochemically deposited nanocrystalline aluminium — •Fabian Bebensee1,2, Wolfgang Maus-Friedrichs1, and Frank Endres2 — 1Insitut für Physik und Physikalische Technologien, TU Clausthal, Leibnizstr. 4, D-38678 Clausthal-Zellerfeld — 2Institut für Metallurgie, TU Clausthal, Robert-Koch-Str. 42, D-38678 Clausthal-Zellerfeld
The applicability of nanocrystalline aluminium in semiconductor devices and corrosion protection is crucially dependent on the oxidation behaviour and interaction of nancrystalline aluminium with molecules from the ambient atmosphere. Nanocrystalline aluminium with grain sizes around 20 nm was deposited onto Si(100)substrates via electrodeposition in the ionic liquid 1-butyl-1-methyl-pyrrolidinium-bis(trifluormethylsulfonyl)imide, saturated with anhydrous AlCl3. The interaction of nanocrystalline aluminium with oxygen was studied with Metastable Impact Electron Spectroscopy (MIES), Ultraviolet Photoelectron Spectroscopy (UPS) and X-Ray Photoelectron Spectroscopy (XPS). The oxidation behaviour of nanocrystalline aluminium is compared to the oxidation behaviour of aluminium films prepared by physical vapour deposition (PVD). The topography of the films being strongly dependent on the deposition parameters was investigated with microscopic techniques.