Dresden 2006 – scientific programme

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O: Oberflächenphysik

O 29: Poster session II (Nanostructures, Magnetism, Particles and clusters, Scanning probe techniques, Time-resolved spectroscopy, Structure and dynamics, Semiconductor surfaces and interfaces, Oxides and insulators, Solid-liquid interfaces)

O 29.32: Poster

Wednesday, March 29, 2006, 14:30–17:30, P2

A Scanning Probe Microscope (SPM) with quasi in-situ Sample Treatment Capabilities — •Markus Hund¹ and Hans Herold² — ¹Physikalische Chemie II, Universität Bayreuth, D-95440 Bayreuth — ²Elektronikwerkstatt der Universität Bayreuth, D-95440 Bayreuth

State-of-the-art SPMs have limited in-situ sample treatment capabilities. Aggressive treatments like plasma etching or etching in aggressive liquids typically require to remove the sample from the microscope. In consequence, time consuming procedures are required if the same spot of the sample is to be imaged after successive processing steps. We have developed a first prototype of an SPM with quasi in-situ sample treatment capabilities based on a commercial atomic force microscope (AFM; Model Dimension 3100, Veeco Instruments Inc.). A sample holder is positioned in a special reactor chamber. The tip can be retracted by several millimeters such that the chamber can be closed for sample treatment. Most importantly, after the treatment the tip is moved back to sample with a lateral drift per process step in the 20 nanometer regime. We discuss recent experiments involving consecutive plasma etching of nanostructured polymer films.