Dresden 2006 – scientific programme
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O: Oberflächenphysik
O 29: Poster session II (Nanostructures, Magnetism, Particles and clusters, Scanning probe techniques, Time-resolved spectroscopy, Structure and dynamics, Semiconductor surfaces and interfaces, Oxides and insulators, Solid-liquid interfaces)
O 29.7: Poster
Wednesday, March 29, 2006, 14:30–17:30, P2
Lithographic Fabrication of Clean Nanostructures by Means of Electron-Beam Induced Deposition (EBID) — •M. Schirmer, T. Lukasczyk, H. Marbach, and H.-P. Steinrück — Universität Erlangen-Nürnberg, Lehrstuhl für Physikalische Chemie II, Egerlandstraße 3, D-91058 Erlangen, Germany
EBID is the electron induced decomposition of chemical compounds and the resulting deposition of the non-volatile fragments. By utilizing a sharp spot of electrons well defined deposit structures in the nanometer range can be achieved in a controlled manner. A common difficulty is the contamination of the deposits due to e.g. residual gases. To avoid this problem an ultra high vacuum chamber is utilized. The integrated UHV electron column creates an electron-beam approximately 2 nm in diameter. This instrument in combination with a lithographic package enables the controlled fabrication of clean nanostructures via EBID. For the characterization of the obtained structures the following probe techniques are housed in the same UHV chamber: scanning tunnelling microscopy, scanning Auger electron microscopy and scanning electron microscopy. To generate pure carbon structures the hydrocarbon ethylene (C2H4) is tested. Other promising candidates for EBID are chemical compounds like silane (SiH4), metal hydrides or organometallic compounds. The concept of the project and first results will be discussed.