Dresden 2006 – wissenschaftliches Programm
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O: Oberflächenphysik
O 39: Nanostructures III
O 39.8: Vortrag
Donnerstag, 30. März 2006, 16:45–17:00, PHY C213
Production of ordered nanometer sized pits with Focused Ion Beams (FIB) — •F. Ghaleh1, R. Köster1, H. Hövel1, L. Bruchhaus2, J. Thiel2, and R. Jede2 — 1Universität Dortmund, Experimentelle Physik I, 44221 Dortmund, Germany — 2Raith GmbH, Hauert 18, Technologiepark, 44227 Dortmund, Germany
Nanometer sized pits on HOPG substrate can be used as nucleation centers to produce clusters with a narrow size distribution. In previous experiments [1] nanometer sized pits were produced by sputtering and oxidizing of the sample. As result we get nanopits which are a few nanometers wide and just one monolayer deep. The pits are distributed at random locations on the surface.
In the present study a focused beam of gallium ions is used to produce the defects at localized positions on the substrate. The Focused Ion Beam (FIB) facility used here was developed within the NanoFIB Project [2]. It can achieve a resolution of about 10 nm [3]. The oxidation of a sample structured with FIB allows to measure areas structured with very small ion intensity or the penetration depth of the incident ions.
[1] H. Hövel, Appl. Phys. A 72, 295 (2001).
[2] http://www.nanofib.com.
[3] J. Gierak, D. Mailly, P. Hawkes, R. Jede, L. Bruchhaus, L. Bardotti, B. Prével, P. Mélinon, A. Perez, R. Hyndman, J.-P. Jamet, J. Ferré, A. Mougin, C. Chappert, V. Mathet, P. Warin, J. Chapman, Appl. Phys. A 80, 187 (2005).