Dresden 2006 – scientific programme

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O: Oberflächenphysik

O 40: Oxides and insulators

O 40.3: Talk

Thursday, March 30, 2006, 15:30–15:45, WIL A317

Frequency Modulated Atomic Force Microscopy and Scanning Tunneling Microscopy of the Ultrathin Aluminum Oxide Film on NiAl(110) — •Markus Heyde, Georg Simon, Hans-Peter Rust, and Hans-Joachim Freund — Fritz-Haber-Institute of the Max-Planck-Society, Faradayweg 4-6, D-14195 Berlin, Germany

Metal oxides are of great technological importance because they are involved in a variety of applications, such as microelectronics or heterogeneous catalysis. The characterization of their properties on the atomic scale is therefore of special interest. The thin aluminum oxide film grown on NiAl(110) serves as an often used model system in catalysis [1]. We have started a detailed analysis by low temperature (5 Kelvin) ultra-high vacuum frequency modulated atomic force microscopy (FM-AFM) and scanning tunneling microscopy (STM) [2] of the thin aluminum oxide film grown on NiAl(110). A model of the structure of this film has been recently published by Kresse et al. [3]. Here we compare our combined FM-AFM and STM measurements with the model of the thin aluminum oxide film.

[1] M. Bäumer and H.-J. Freund, Progress in Surface Science 61, 127 (1999).

[2] M. Heyde, M. Kulawik, H.-P. Rust, H.-J. Freund, Rev. Sci. Instrum. 75, 2446 (2004).

[3] G. Kresse et al., Science 308, 1440 (2005).