Frankfurt 2006 – wissenschaftliches Programm

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A: Atomphysik

A 7: Wechselwirkung von Materie mit Ionen

A 7.1: Vortrag

Dienstag, 14. März 2006, 14:30–14:45, H7

Sputtering of uranium dioxide and lithium fluoride by highly charged ions — •Hermann Rothard, Jerome Lenoir, Fabien Haranger, Thorsten Jalowy, Smail Boudjadar, Brigitte Ban dEtat, Philippe Boduch, Serge Bouffard, Amine Cassimi, Henning Lebius, Bruno Manil, and Laurent Maunoury — CIRIL-Ganil, BP5133, F-14070 Caen Cedex 05, France

Sputtering of uranium dioxide was studied at CIRIL-Ganil both at high energy in the electronic stopping power regime (MeV/u; NIMB141,1998,372), and with low-energy highly charged ions (q keV) where nuclear stopping is important. Further effects related to the high projectile charge (potential sputtering) can occur. Angular distributions and total sputter yields were measured by means of the catcher technique (Physica Scripta T110 (2004) 389) with Xe ions of different charge (q=1-25) and kinetic energy (1.5-81 keV). We have also measured the contribution of emitted (UOx)n clusters (n=1-7) by time-of-flight secondary ion mass spectroscopy (Eur. Phys. J. D32 (2005) 19). Furthermore, we applied the TOF-XY-imaging technique to ion-surface collisions in the two different velocity regimes, i.e. at 10 MeV/u (electronic stopping) and at low velocity (0.1 atomic units). This technique allows to study the momentum distribution of emitted secondary ions (velocity and angle). We present first results obtained with uranium dioxide and lithium fluoride.