Frankfurt 2006 – scientific programme
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Q: Quantenoptik und Photonik
Q 64: Photonische Kristalle V
Q 64.7: Talk
Thursday, March 16, 2006, 15:30–15:45, HI
Recent progress in silicon double inversion of three-dimensional polymer photonic crystal templates — •Martin Hermatschweiler1, Markus Deubel1,2,3, Martin Wegener1,2,3, Fabian Pérez-Willard3, Nicolas Tétreault4, Geoffrey A. Ozin4, and Georg von Freymann3 — 1Institut für Angewandte Physik, Universität Karlsruhe (TH), 76128 Karlsruhe — 2Institut für Nanotechnologie, Forschungszentrum Karlsruhe, 76021 Karlsruhe — 3CFN, Universität Karlsruhe (TH), 76128 Karlsruhe — 4Department of Chemistry, University of Toronto, Toronto, Ontario M5S 3H6, Canada
We present recent progress in converting polymer templates into 3D silicon (Si) photonic crystals (PCs) by using a silicon-double-inversion procedure [1]. This has led to Si woodpiles with both improved structural and optical quality. In a first step the polymer template is infiltrated with amorphous silica by applying atomic layer deposition (ALD). After removal of the silica cap layer via reactive ion etching (RIE) the polymer is either combusted or etched in air plasma, which results in a silica inverse woodpile. Now, ALD can be repeated in order to fine-tune the filling fraction of the resulting Si PC, thereby allowing optimization of the photonic bandgap. Next the woodpile is infiltrated with Si by chemical vapor deposition with disilane as the precursor. Again, the Si cap layer is removed by RIE. Wet etching with a few drops of 1% HF placed on the structure finally double-inverts the original template into its Si replica. The original substrate is kept during all process steps, thus paving the way for in-plane optical characterization of three-dimensional Si PCs.
[1] N. Tétreault et al., Adv. Mater., DOI: 10.1002/adma.200501674