Düsseldorf 2007 – scientific programme

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P: Fachverband Plasmaphysik

P 16: Poster

P 16.10: Poster

Wednesday, March 21, 2007, 16:30–18:30, Poster A

On limitations of ultra clean plasma immersion ion implantation (PIII) for surface oxidation of titanium — •Martin Polak, Hartmut Steffen, Karsten Schröder, Andreas Ohl, and Klaus-Dieter Weltmann — Institut für Niedertemperatur Plasmaphysik, Felix - Hausdorff - Str. 2, 17489 Greifswald, Deutschland

Plasma-immersion-ion-implantation (PIII) is a useful method for in depth control of subsurface elementary and chemical composition and also of crystal structure of metallic samples. Generally, the working gas is one of the key parameters which determine the type of modification. But, inherently related to this method is a chance that gas phase contaminations especially with metallic ions arise which can alter the modification results. This can be of relevance for technical application. Here, e.g., such effect was investigated for the case of O2 and H2O plasma based modifications of titanium surfaces intended for biocompatibility improvement. It could be shown that a special experimental setup leads to a contamination of the titanium surface with elements like Fe, Cr and Ni. XPS measurements without air contact (in situ) were used to examine the surface composition after the PIII. In addition, XPS depth profiling was performed with Ar ion beam sputtering. The measured profiles were compared with a simulation of SRIM 2006 and a good agreement could be determined. With this method it was also possible to measure the natural gradient layer of oxide in the untreated titanium sample.