Düsseldorf 2007 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

P: Fachverband Plasmaphysik

P 17: Niedertemperaturplasmen

P 17.3: Vortrag

Donnerstag, 22. März 2007, 12:00–12:15, 6B

Thin film deposition by means of atmospheric pressure microplasma jet — •Jan Benedikt, Angel Yanguas-Gil, Kai Focke, and Achim von Keudell — Arbeitsgruppe Reaktive Plasmen, Fakultät für Physik und Astronomie, Ruhr-Universität Bochum, Universitätsstr. 150, 44780 Bochum, Deutschland

Atmospheric pressure glow discharge (APGD) plasma deposition of good quality thin films is a challenging task, which, when achieved, can substantially reduce costs of the plasma equipment, since the generation of vacuum can be avoided, and can therefore enlarge the field of plasma deposition applications to low-value-added processes. However, slow diffusion, absence of the ion bombardment and a limited set of conditions, under which a stable and homogeneous APGD can be operated, are factors, which prevent the spread of APGD deposition applications so far. A possible approach is a use of microplasmas. They can generate non-equilibrium glow discharges with high electron density and low gas temperature at atmospheric pressure. We have constructed and tested an atmospheric pressure microplasma jet that serves as a depositing tool for production of homogeneous thin films. In our presentation, we will discuss the strategies, how to form reactive species in the plasma without deposition inside the source and how to prevent ambient atmosphere from penetrating into the microplasma jet. In addition, we will show the results of plasma characterization by means of current-voltage measurements, optical emission spectroscopy and mass spectrometry. Finally, the properties of the films, deposited from acetylene, tetramethylsilane and allylamine, will be discussed.