Düsseldorf 2007 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 22: Poster

P 22.25: Poster

Donnerstag, 22. März 2007, 16:30–18:30, Poster A

Preparation of nanostructured C:F films — Achim von Keudell, Jan Benedikt, Angel Yanguas-Gil, and •Tim Baloniak — Ruhr-Universität Bochum, D-44780 Bochum

Fluorocarbon thin films were deposited under various conditions from a capacitively coupled plasma using c-C₄F₈ as precursor. These films have been found to present very low surface energies of about 11 mJ/m² which makes them interesting candidates for plasma-enhanced deposition of superhydrophobic coatings. Smooth a-C:F films extracted from the discharge never show water contact angles larger than 110^∘ which corresponds quite well to the wettability of commercially available bulk teflon. However, additional features on the coating surface including roughness, porosity or fractal structure allow to shift water contact angles from the hydrophobic to the superhydrophobic range. In our work plasma process parameters which lead to suitable micro-structuring are under investigation. Gas phase analysis is performed by mass spectrometry, optical emission spectroscopy and Langmuir probe measurements. Thin films are characterised by spectroscopic ellipsometry, atomic force microscopy and Fourier-transform infrared spectroscopy. Coatings with water contact angles as high as 165^∘ were obtained.