 |
Mo, 09:30–11:00 |
H32 |
DS 1: Organic Thin Films I |
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Mo, 11:15–13:00 |
H32 |
DS 2: Organic Thin Films II |
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Mo, 09:30–11:00 |
H34 |
DS 3: Metal Layers and Multilayers |
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Mo, 11:15–12:45 |
H34 |
DS 4: Nanoengineered Thin Films |
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Mo, 14:30–15:45 |
H32 |
DS 5: Organic Interfaces (SYOE 1) |
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Mo, 16:00–17:45 |
H32 |
DS 6: Organic Photovoltaics (SYOE 2) |
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Mo, 18:00–19:00 |
H32 |
DS 7: Organic Film Aging (SYOE 3) |
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Mo, 14:30–15:15 |
H34 |
DS 8: Hard Coatings I |
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Mo, 15:15–17:00 |
H34 |
DS 9: Hard Coatings II |
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Mo, 17:15–19:00 |
H34 |
DS 10: Layers with Magnetic Properties |
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Di, 09:30–13:15 |
H32 |
DS 11: Symposium: New Materials for Nanoelectronics |
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Di, 14:30–15:15 |
H34 |
DS 12: Thin Film Analytics I |
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Di, 15:15–16:30 |
H34 |
DS 13: Thin Film Analytics II |
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Di, 16:45–18:00 |
H34 |
DS 14: Thin Film Analytics III |
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Di, 15:00–17:00 |
Poster B |
DS 15: Poster Session |
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Mi, 14:30–16:30 |
H32 |
DS 16: Organic Light Emitting Diodes (SYOE 9) |
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Mi, 16:45–18:45 |
H32 |
DS 17: Contact Properties (SYOE 10) |
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Mi, 15:00–17:00 |
H34 |
DS 18: Symposium: In situ Optics I |
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Mi, 17:15–18:45 |
H34 |
DS 19: Symposium: In situ Optics II |
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Do, 09:30–11:00 |
H32 |
DS 20: Symposium: Real Time Growth Studies I |
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Do, 11:15–12:45 |
H32 |
DS 21: Symposium: Real Time Growth Studies II |
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Do, 09:30–10:00 |
H34 |
DS 22: In situ STM |
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Do, 10:00–11:00 |
H34 |
DS 23: Symposium: In situ Optics III |
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Do, 11:15–13:15 |
H34 |
DS 24: Ion Beam Techniques |
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Do, 15:00–18:30 |
H32 |
DS 25: Symposium: Real Time Growth Studies III |
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Do, 15:00–17:45 |
H34 |
DS 26: Oxides |
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|
Fr, 09:30–11:15 |
H32 |
DS 27: Polymer and Composite Films |
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Fr, 11:30–12:45 |
H32 |
DS 28: Silicon Thin Films and Interfaces |
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