Regensburg 2007 – scientific programme
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DS: Fachverband Dünne Schichten
DS 14: Thin Film Analytics III
DS 14.1: Talk
Tuesday, March 27, 2007, 16:45–17:00, H34
Non-destructive speciation of deeply buried TiOx nanolayers and their interfaces — •Beatrix Pollakowski1, Burkhard Beckhoff1, Stefan Braun2, Peter Gawlitza2, Falk Reinhardt1,3, and Gerhard Ulm1 — 1Physikalisch-Technische Bundesanstalt, Abbestr. 2-12, 10587 Berlin — 2Fraunhofer Institut Werkstoff- und Strahltechnik, Winterbergstr. 28, 01277 Dresden — 3TU Berlin, Straße des 17. Juni 135, 10623 Berlin
Enabling high dynamics of depth information the analysis with grazing incident X-ray fluorescence combined with near edge X-ray absorption fine structure (GIXRF-NEXAFS) provides a tool to probe buried interfaces with an information depth in the range from a few to several hundreds of nanometers. In our study we focused on different oxidized titanium layers (thickness 30 nm) deposited with ion beam sputtering deposition on a standard 8” silicon wafer and buried with a 5 nm carbon layer to have an appropriate system and, in addition, to prevent further oxidation processes.
The GIXRF-NEXAFS measurements were carried out a the plane grating monochromator (PGM) beamline for undulator radiation at the PTB laboratory at BESSY II. Distinguishing between different kind of chemical bonds GIXRF-NEXAFS at the O - K edge and respectively the Ti-Liii,ii edges was employed for the speciation of the TiOx layers.
Initial results confirm that GIXRF-NEXAFS has the potential of depth profiling of deeply buried interfaces with respect to layer composition and elemental speciation.