Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 15: Poster Session

DS 15.3: Poster

Dienstag, 27. März 2007, 15:00–17:00, Poster B

IR mapping ellipsometry of ultrathin organic films on metallic and semiconducting substrates — •Dana Maria Rosu¹, Michael Gensch³, Karen Kavanagh⁴, Wenjie Li⁴, Julia Hsu⁵, Norbert Esser¹, Ullrich Schade², and Karsten Hinrichs¹ — ¹ISAS - Institute for Analytical Sciences, Department Berlin, Albert-Einstein-Str. 9, 12589 Berlin, Germany — ²Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung mbH, Albert-Einstein-Str. 15, 12589 Berlin, Germany — ³DESY - Deutsches Elektronen-Synchrotron, Notkestr. 85, 22607 Hamburg, Germany — ⁴Kavanagh Lab, Dept. of Physics, Simon Fraser University, 8888 University Dr., Burnaby, BC, V5A 1S6, Canada — ⁵Sandia National Laboratories, Albuquerque, New Mexico 87185- 1120

An infrared spectroscopic ellipsometer is used for analysis of organic films on metals or semiconducting substrates. Monolayer sensitivity is achieved and lateral resolution was improved by utilizing the synchrotron mapping ellipsometer at BESSY II. IR synchrotron ellipsometry enables investigation of sample areas from 0.0625 mm² to 1 mm². The organic compound is identified by specific vibrational bands. Evaluation of measured spectra with optical models gives information about coverage and molecular orientation.