Regensburg 2007 – scientific programme

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DS: Fachverband Dünne Schichten

DS 15: Poster Session

DS 15.51: Poster

Tuesday, March 27, 2007, 15:00–17:00, Poster B

Ion induced self-organization on pre-patterned Si surfaces — Theresa Lutz, •Bashkim Ziberi, Renate Fechner, Dietmar Hirsch, Klaus Zimmer, Frank Frost, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung e. V., 04318 Leipzig

Due to the simplicity of the method, and the possibility to produce large-area nanostructured surfaces self-organization induced by low-energy ion beam erosion offers an alternative, simple and cost-efficient route for nanostructuring of surfaces. Especially the short-range order of the formed nanostructures can be quite high. However, usually this self-organization process lacks long-range order and positional control of the pattern. One possibility to improve this ordering is a appropriate choice of erosion conditions to achieve a long range ordering of the dot or ripple structures. Another possibility to influence the ordering of structures is by using pre-patterned substrates. In this way due to spatial limitations and guided by the lateral ordering of the pre-patterned templates the evolving topography shows an improved ordering. Additionally, an improved positional control can be achieved. In this work the fabrication principle also known as guided self-organization is applied to form ripple and dot pattern on pre-patterned Si surfaces during low energy (≤ 2000 eV) Kr⁺ and Xe⁺ ion beam erosion.