Regensburg 2007 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 2: Organic Thin Films II
DS 2.5: Vortrag
Montag, 26. März 2007, 12:15–12:30, H32
Characterization and Modification of the Hexaphenyl Wetting Layer on Mica (001) — •Paul Frank1, Gregor Hlawacek2, Christian Teichert2, and Adolf Winkler1 — 1Institute of Solid State Physics, TU Graz, Petersgasse 16, A-8010 Graz, Austria — 2Institute of Physics, University of Leoben, Franz Josef Straße 18, A-8700 Leoben, Austria
In this contribution we investigate the hexaphenyl (6P) monolayer formation on mica (001) by surface science methods. The 6P films were prepared by organic molecular beam deposition (OMBD). TDS was used to get information on the monolayer formation. XPS and LEED were used to characterize the mica surface before 6P thin film deposition. All measurements were carried out under UHV conditions. In addition, the grown films were investigated ex-situ by AFM. The TDS measurements show that there exists a monolayer of flat laying 6P molecules on the untreated mica surface. The main goal of this work was to tailor the monolayer formation and for this purpose surface modifications were applied on the mica sample. The modifications have been realized through a change in surface composition or by a change of the surface structure. For this purpose, the surface was covered with a carbon layer via X-ray induced dissociation of 6P (change of surface composition) or sputtered, using low energy Ar+ ion beams (change of surface structure). TDS and AFM investigations showed a significant change in the monolayer formation, from flat laying molecules on the untreated mica surface to upright standing molecules on the carbon covered as well as on the sputtered mica surface.