DS 24: Ion Beam Techniques
Thursday, March 29, 2007, 11:15–13:15, H34
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11:15 |
DS 24.1 |
Ion Beam induced Glancing Angle Deposition of silicon nanostructures — •Christian Patzig, Wilfried Erfurth, Alexey Milenin, and Bernd Rauschenbach
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11:30 |
DS 24.2 |
Energy dependence of the surface topography on Si and Ge during ion beam erosion: Change of ripple orientation — •Bashkim Ziberi, Frank Frost, Theresa Lutz, and Bernd Rauschenbach
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11:45 |
DS 24.3 |
Biaxially textured polycrystalline Ag films on amorphous Si by ion beam assisted deposition — •Daniel Förster, Sebastian Bleikamp, and Thomas Michely
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12:00 |
DS 24.4 |
Selektive Diffusion durch Ionenbestrahlung: Gold in amorphem Silizium — Peter Kächler, Andreas Klimmer, Hans-Gerd Boyen, Christian Pfahler, Moritz Trautvetter, •Paul Ziemann, Johannes Biskupek, Ute Kaiser und Paul Walther
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12:15 |
DS 24.5 |
Messung der winkelabhängigen Sputterrate und der Sekundärelektronenausbeute bei der FIB-Bearbeitung von ein- und polykristallinen Metallen — •Yuliya Stark, Robert Frömter und Hans Peter Oepen
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12:30 |
DS 24.6 |
Mechanical stress in low-energy ion-irradiated germanium: Experiments and simulations — •Tobias Edler and S.G. Mayr
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12:45 |
DS 24.7 |
Nanoporous carbon thin films manufactured by ion beam treatment of self-assembled block-copolymer nanotemplates — •Valeriy Luchnikov, Manfred Stamm, Alexey Konduyrin, and Marcela Bilek
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13:00 |
DS 24.8 |
Transport von Ionen durch dünne Filme und Membrane — •Eva Unger, Thomas Kolling, Shutao Sun und Karl-Michael Weitzel
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