Regensburg 2007 – scientific programme

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DS: Fachverband Dünne Schichten

DS 27: Polymer and Composite Films

DS 27.7: Talk

Friday, March 30, 2007, 11:00–11:15, H32

Deposition of silicon oxide thin films on polymer films using magnetron based PECVD and high frequency PECVD — •John Fahlteich¹, Ralph Schmittgens², Matthias Fahland¹, Björn Meyer¹, and Waldemar Schönberger¹ — ¹Fraunhofer Institut für Elektronenstrahl- und Plasmatechnik, Dresden, Germany — ²Technische Universität Dresden, Institut für Festkörperelektronik, Dresden, Germany

In this study we investigated the deposition of silicon-oxide (SiOx) thin films on flexible polymer substrates using magnetron-based plasma enhanced chemical vapor deposition (Mag-CVD) and very high frequency (VHF 60 MHz) PECVD. Hexamethyldisiloxane (HMDSO) and oxygen were used as precursor materials. The Mag-CVD process was performed using a dual magnetron sputter system with a 40 MHz mid-frequency power supply.

Both the process-gas excitation and the fragmentation of the monomer were analyzed using optical emission spectroscopy. Additionally similar deposition rates could by achieved for both processes. However, the Mag-CVD process runs at a significantly lower process pressure. Chemical bonds within the different SiOx layers could be compared by analyzing the FT-IR spectra. The film composition was characterized in dependence on both the monomer and the reactive gas flow using X-Ray photoelectron spectroscopy. The thin film properties could be varied from siloxane plasma polymers to inorganic silicon oxide without changing the gas composition.