Regensburg 2007 – scientific programme
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DS: Fachverband Dünne Schichten
DS 7: Organic Film Aging (SYOE 3)
DS 7.3: Talk
Monday, March 26, 2007, 18:30–18:45, H32
Real-time observation of oxidation and photo-oxidation of rubrene thin films by spectroscopic ellipsometry — •Milan Kytka1,2, Alexander Gerlach1, Frank Schreiber1, and Jaro Kováč2 — 1Institut für Angewandte Physik, Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen, Germany — 2Faculty of Electrical Engineering and Information Technology, Slovak University of Technology, Ilkovičova 3, 812 19 Bratislava, Slovak Republic
We follow in real-time and under controled conditions the oxidation of the organic semiconductor rubrene grown on SiO2 using spectroscopic ellipsometry. We derive the complex dielectric function ε1 + iε2 for pristine and oxidized rubrene showing that the oxidation is accompanied by a significant change of the optical properties, namely the absorption. We observe that photo-oxidation of rubrene is much faster than oxidation without illumination.
By following different absorption bands (around 2.5 eV and 4.0 eV for pristine rubrene and around 4.9 eV for oxidized rubrene) we infer that the photo-oxidation of these films involves non-Fickian diffusion mechanisms.