Regensburg 2007 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 9: Hard Coatings II

DS 9.3: Vortrag

Montag, 26. März 2007, 15:45–16:00, H34

Kinetic modeling of BN deposition by PECVD — •Sarah Panowitz, Jens Matheis, and Achim Lunk — Institut für Plasmaforschung, Universität Stuttgart, Pfaffenwaldring 31, D-70569 Stuttgart

We present kinetic modeling of BN deposition by PECVD in the system B-N-H-X where X represents the gases F, Cl, Br or O, respectively. In the first step the thermodynamic data as well as kinetic coefficients are collected from literature and compared with each others. The kinetic coefficients also include the most important plasma reactions. With data set up selected calculations were performed in the program "CHEMKIN". Kinetic modeling was executed with the perfectly stirred reactor model. This model requires modeling of volume reactions as well as reactions on the surface. The rate coefficients for the surface reactions are investigated through parameter studies. Results of these parameter studies are compared with data known from experiments to obtain the probably way of reaction mechanisms. Data from kinetic modeling are also compared with results from calculations in thermodynamic equilibrium. Results of kinetic and equilibrium modeling show that the range where BN can be deposited is very sensitive to the mole fraction of the species X which is used. Using oxygen as well as fluorine there exist only few parameter compositions to deposit BN. These parameter sets are very important in relation to possible etching effects in PECVD of c-BN deposition.