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HL: Fachverband Halbleiterphysik
HL 46: Poster 2
HL 46.72: Poster
Donnerstag, 29. März 2007, 15:00–17:30, Poster A
Stability of Mesoporous Ultra-low Refractive Index Substrates — •Denan Konjhodzic1, Matthias Herrmann2, and Frank Marlow1 — 1Max-Planck-Institut für Kohlenforschung, Kaiser-Wilhelm-Platz 1, D-45470 Mülheim an der Ruhr, marlow@mpi-muelheim.mpg.de, www.mpi-muelheim.mpg.de/marlow.html — 2Technische Universität Chemnitz, Straße der Nationen 62, D-09107 Chemnitz
Mesoporous silica films synthesized by dip-coating in an evaporation-induced self-assembly process have been used for the first time as low-n substrates for 2D photonic crystals [1]. They have wide applications in the field of photonic crystals and optical waveguides. The optimized low refractive index films (n = 1.18) have been synthesized at low humidity conditions, whereas at higher humidity other interestingly structured films are found [2].
In this contribution we investigate the stability of the films in respect to thermal and mechanical stress, as well as the stability upon high humidity treatment and ageing. The structure stability was shown by small angle X-ray scattering and refractive index measurements. The mechanical properties (e.g. Young modulus) were determined from the nanoindentation. Stability of the refractive index was investigated with the angle-dependent interferometry and was found to be high under ambient humidity and temperature conditions.
[1] M. Schmidt et al., Appl. Phys. Lett. 85 (2004) 16
[2] D. Konjhodzic et al., Appl. Phys. A 81 (2005) 425