Regensburg 2007 – scientific programme
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MM: Fachverband Metall- und Materialphysik
MM 15: Phase transitions I
MM 15.1: Talk
Tuesday, March 27, 2007, 10:15–10:30, H4
Combinatorial study of the phase transformation characteristics of Ti-Ni-X (X = Cu, Pd) shape memory thin film composition spreads — •Robert Zarnetta1,2, Sigurd Thienhaus1,2, Alan Savan1, and Alfred Ludwig1,2 — 1Combinatorial Material Science group, caesar, Ludwig-Erhard-Allee 2, 53175 Bonn, Germany — 2Ruhr-University Bochum, Institute of Materials, 44780 Bochum, Germany
The phase transformation properties of Ti-Ni-X (X=Cu,Pd) shape memory thin films prepared in the form of continuous composition spreads were investigated. The thin film materials libraries were fabricated from elemental targets using an ultra-high vacuum combinatorial magnetron sputter-deposition system. Alternating wedge-type layers of Ti, Ni, and Cu (Pd) were deposited on a thermally oxidized Si wafer and subsequently annealed at 500°C for 1h in situ. Automated temperature-dependent resistance measurements (R(T)), energy dispersive X-ray analysis (EDX) and X-ray diffraction measurements (XRD) revealed the compositional region in the ternary phase diagram where thermoelastic transformations occur. The transformation temperatures and the thermal hysteresis were determined from R(T) measurements.