Regensburg 2007 – scientific programme

Parts | Days | Selection | Search | Downloads | Help

O: Fachverband Oberflächenphysik

O 12: Nanostructures at Surfaces II (Wires, Tubes)

O 12.10: Talk

Monday, March 26, 2007, 16:30–16:45, H36

A Route to Generate Clean Nanostructures with Arbitrary Shapes on Silicon by Electron-Beam Induced Deposition (EBID) — •Michael Schirmer, Thomas Lukasczyk, Hubertus Marbach, and Hans-Peter Steinrück — Lehrstuhl für Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstraße 3, D-91058 Erlangen, Germany

EBID is a technique with a high potential for the fabrication of nanostructures on different surfaces. By utilizing a highly focussed electron beam, precursor molecules are locally cracked, resulting in the deposition of the non-volatile molecule fragments. A lithography package enables the fabrication of spatially well defined ultra-small deposit structures of arbitrary shapes. The distinct approach of this paper is to use a high resolution UHV electron column (resolution < 3 nm), integrated in an ultra-high vacuum (UHV) apparatus, in order to avoid contaminations due to residual gases in the chamber. For the fabrication of metallic nanostructures on silicon substrates, various organometallic precursors, in particular transition metal carbonyls, were used. Iron pentacarbonyl, Fe(CO)₅, turned out to be a suitable precursor for clean EBID deposits. The resulting iron nanostructures exhibit a very high purity, which was determined by local Auger electron spectroscopy. On clean Si(111) and Si(100) surfaces, discontinuous iron structures are observed, which consist of small dots with a size of < 10 nm. Auger measurements indicate that these EBID deposits grow on a composite layer, which homogeneously covers the silicon substrates.