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Regensburg 2007 – scientific programme

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O: Fachverband Oberflächenphysik

O 32: Semiconductor Substrates

Tuesday, March 27, 2007, 15:45–17:30, H39

15:45 O 32.1 Dynamics and energetics of Ge(001) dimers — •Harold Zandvliet, Arie van Houselt, Raoul van Gastel, and Bene Poelsema
16:00 O 32.2 Interlayer interaction and electronic screening in multilayer graphene — •Karsten Horn, Taisuke Ohta, Aaron Bostwick, Jessica McChesney, Thomas Seyller, and Eli Rotenberg
16:15 O 32.3 High energy femtosecond UV photo desorption dynamics of NO from HOPG at FLASH — •Tim Hoger, Björn Siemer, Carsten Thewes, Marco Rutkowski, Helmut Zacharias, Stefan Düsterer, and Rolf Treusch
16:30 O 32.4 Photoisomerization of Stilbene on Si(100): Gaining further insight by combined theoretical and experimental C 1s NEXAFS spectra — •Christine Kolczewski, Klaus Hermann, Ralph Püttner, Philipp Martin Schmidt, Thorsten Kampen, and Karsten Horn
16:45 O 32.5 Identifying isomerization - combined experimental and theoretical NEXAFS studies — •Philipp Martin Schmidt, Ralph Püttner, Christine Kolczewski, Klaus Hermann, Karsten Horn, and Thorsten Kampen
17:00 O 32.6 Individual molecules of hexaphenyl on Si(100)-2x1 — •Marion Cranney, Marta Martin, Andrew Mayne, Damien Riedel, and Gérald Dujardin
17:15 O 32.7 Investigations of Ga adsorption on Si(113) with scanning tunneling microscopy — •Moritz Speckmann, Thomas Schmidt, Subhashis Gangopadhyay, David Krueger, Torben Clausen, and Jens Falta
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